Keynote speakers
Name, Institution | Tentative Title |
Christophe Maleville, Soitec, France | Trends and roadmaps for engineered semiconductor substrates |
Heike E. Riel, IBM Zürich, Switzerland | Group-III-V on Silicon microelectronics and photonics |
Invited speakers
Name, Institution | Tentative Title |
Gabriel Aeppli, EPFL Lausanne, ETH Zürich, Switzerland | Device characterization using X-ray Microscopy and Spectroscopy at the Swiss Light Source |
Erik Bakkers, TU Eindhoven, Netherlands | Direct bandgap emission from hexagonal Ge and SiGe alloys |
Simona Binetti, Univ. Milano Bicocca, Italy | Infrared photoluminescence of defects in crystalline and multi-crystalline Si |
Magnus Borgström, Lund University, Sweden | Nanowire tandem junction solar cells |
Neil Curson, UCL, United Kingdom | Deterministic As impurities in Silicon |
Anaïs Dreau, Univ. Montpellier, France | G-centers in Si as artificial atoms |
Nicholas Grant, Univ. Warwick, United Kingdom | Gallium doped silicon for high efficiency silicon solar cells |
Antonino La Magna, CNR-IMM Catania, Italy | Modelling of excimer laser annealing processes in future nanoscale devices |
Chris Lew, University of Melbourne | Quantum sensing with spin defects in SiC devices |
Dominique Mangelinck, CNRS, France | Challenges and issues for contacts in microelectronics |
Felipe Murphy-Armando, Tyndall, Ireland | Direct-gap light-emission from point defects in Germanium |
Takashi Nakayama, Chiba University, Japan | Resonance enhanced tunneling currents at Si-pn junctions; theoretical study |
Tim Niewelt, Fraunhofer ISE, Germany | Establishing the true limit of silicon’s performance: a multi-institutional collaboration to redefine silicon’s carrier lifetime limit |
Clemens Ostermaier, Infineon Technologies | Defect aspects of C-doped GaN buffers |
Fabrizio Rovaris, NOMATEN centre of excellence, Poland | Simulation of dislocation dynamics in the presence of surfaces |
Jan Schmidt, ISFH, Germany | Surface passivation of crystalline silicon solar cells: Past, present and future |
Alexander L. Shluger, UCL, United Kingdom | Defects in oxides in Electronic devices |
Hans Sigg, Paul Scherrer Institut, Villigen, Switzerland | Recent progress on group-IV Lasers on Silicon |
Jonatan Slotte, Aalto University & University of Helsinki, Finland | Positron Annihilation spectroscopy open volume defects in highly n-type doped Ge and GeSn layers |
Michelle Vaqueiro Contreras, UNSW, Australia | Graphene oxides as passivators for silicon surfaces |
Jan Vobecky, Hitachi, ABB Power Grids, Switzerland | Impact of defect engineering on high power devices for environmental free technologies |